OSTEMER 220 Litho
A UV-curable thiol-ene/epoxy resin optimized for lithographic patterning. Offers excellent adhesion and chemical resistance. Perfect for researchers needing precise micro/nanopatterning capabilities with OSTE-based chemistry.
Limited stock for this quantity. You can still order — delivery may take longer than the usual lead time.
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OSTEMER 220 Litho is a UV-curable thiol-ene/epoxy resin optimized for lithographic patterning. It offers excellent adhesion and chemical resistance, making it ideal for researchers needing precise micro/nanopatterning capabilities with OSTE-based chemistry. Designed to work with standard UV lithography equipment.
Key Features
- Optimized for lithographic patterning
- Excellent adhesion and chemical resistance
- High aspect ratio structures achievable
- Dry bonding to multiple substrates
- Built-in thiol anchors for surface modification
- SU-8 compatible processing
Processing
OSTEMER 220 Litho is a UV-curable thiol-ene/epoxy resin designed for lithographic patterning. It can be spin-coated onto substrates and patterned using standard UV lithography masks, achieving features down to the micrometer scale. After UV exposure, a post-exposure bake completes the cross-linking. The material offers excellent adhesion to glass, silicon, and metals, making it ideal for multi-layer microfluidic devices.
Application Gallery
Explore examples of devices and structures fabricated using OSTEMER resins. Click any image to enlarge.
Point-of-Care Diagnostics
Microsystem Technology
Microfluidic Chip Structures